Rethinking Out-of-Distribution (OOD) Detection: Masked Image Modeling Is All You Need

Jingyao Li, Pengguang Chen, Zexin He, Shaozuo Yu, Shu Liu, Jiaya Jia; Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR), 2023, pp. 11578-11589

Abstract


The core of out-of-distribution (OOD) detection is to learn the in-distribution (ID) representation, which is distinguishable from OOD samples. Previous work applied recognition-based methods to learn the ID features, which tend to learn shortcuts instead of comprehensive representations. In this work, we find surprisingly that simply using reconstruction-based methods could boost the performance of OOD detection significantly. We deeply explore the main contributors of OOD detection and find that reconstruction-based pretext tasks have the potential to provide a generally applicable and efficacious prior, which benefits the model in learning intrinsic data distributions of the ID dataset. Specifically, we take Masked Image Modeling as a pretext task for our OOD detection framework (MOOD). Without bells and whistles, MOOD outperforms previous SOTA of one-class OOD detection by 5.7%, multi-class OOD detection by 3.0%, and near-distribution OOD detection by 2.1%. It even defeats the 10-shot-per-class outlier exposure OOD detection, although we do not include any OOD samples for our detection.

Related Material


[pdf] [supp] [arXiv]
[bibtex]
@InProceedings{Li_2023_CVPR, author = {Li, Jingyao and Chen, Pengguang and He, Zexin and Yu, Shaozuo and Liu, Shu and Jia, Jiaya}, title = {Rethinking Out-of-Distribution (OOD) Detection: Masked Image Modeling Is All You Need}, booktitle = {Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR)}, month = {June}, year = {2023}, pages = {11578-11589} }