Designing Phase Masks for Under-Display Cameras

Anqi Yang, Eunhee Kang, Hyong-Euk Lee, Aswin C. Sankaranarayanan; Proceedings of the IEEE/CVF International Conference on Computer Vision (ICCV), 2023, pp. 10637-10645

Diffractive blur and low light levels are two fundamental challenges in producing high-quality photographs in under-display cameras (UDCs). In this paper, we incorporate phase masks on display panels to tackle both challenges. Our design inserts two phase masks, specifically two microlens arrays, in front of and behind a display panel. The first phase mask concentrates light on the locations where the display is transparent so that more light passes through the display, and the second phase mask reverts the effect of the first phase mask. We further optimize the folding height of each microlens to improve the quality of PSFs and suppress chromatic aberration. We evaluate our design using a physically-accurate simulator based on Fourier optics. The proposed design is able to double the light throughput while improving the invertibility of the PSFs. Lastly, we discuss the effect of our design on the display quality and show that implementation with polarization-dependent phase masks can leave the display quality uncompromised.