LeafMask: Towards Greater Accuracy on Leaf Segmentation

Ruohao Guo, Liao Qu, Dantong Niu, Zhenbo Li, Jun Yue; Proceedings of the IEEE/CVF International Conference on Computer Vision (ICCV) Workshops, 2021, pp. 1249-1258


Leaf segmentation is the most direct and effective way for high-throughput plant phenotype data analysis and quantitative researches of complex traits. Currently, the primary goal of plant phenotyping is to raise the accuracy of the autonomous phenotypic measurement. In this work, we present the LeafMask neural network, a new end-to-end model to delineate each leaf region and count the number of leaves, with two main components: 1) the mask assembly module merging position-sensitive bases of each predicted box after non-maximum suppression (NMS) and corresponding coefficients to generate original masks; 2) the mask refining module elaborating leaf boundaries from the mask assembly module by the point selection strategy and predictor. In addition, we also design a novel and flexible multi-scale attention module for the dual attention-guided mask (DAG-Mask) branch to effectively enhance information expression and produce more accurate bases. Our main contribution is to generate the final improved masks by combining the mask assembly module with the mask refining module under the anchor-free instance segmentation paradigm. We validate our LeafMask through extensive experiments on Leaf Segmentation Challenge (LSC) dataset. Our proposed model achieves the 90.09% BestDice score outperforming other state-of-the-art approaches.

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[pdf] [arXiv]
@InProceedings{Guo_2021_ICCV, author = {Guo, Ruohao and Qu, Liao and Niu, Dantong and Li, Zhenbo and Yue, Jun}, title = {LeafMask: Towards Greater Accuracy on Leaf Segmentation}, booktitle = {Proceedings of the IEEE/CVF International Conference on Computer Vision (ICCV) Workshops}, month = {October}, year = {2021}, pages = {1249-1258} }