Attention-based Ensemble for Deep Metric Learning

Wonsik Kim, Bhavya Goyal, Kunal Chawla, Jungmin Lee, Keunjoo Kwon; Proceedings of the European Conference on Computer Vision (ECCV), 2018, pp. 736-751


Recently, ensemble has been applied to deep metric learning to yield state-of-the-art results. Deep metric learning aims to learn deep neural networks for feature embeddings, distances of which satisfy given constraint. In deep metric learning, ensemble takes average of distances learned by multiple learners. As one important aspect of ensemble, the learners should be diverse in their feature embeddings. To this end, we propose an attention-based ensemble, which uses multiple attention masks, so that each learner can attend to different parts of the object. We also propose a divergence loss, which encourages diversity among the learners. The proposed method is applied to the standard benchmarks of deep metric learning and experimental results show that it outperforms the state-of-the-art methods by a significant margin on image retrieval tasks.

Related Material

[pdf] [arXiv]
author = {Kim, Wonsik and Goyal, Bhavya and Chawla, Kunal and Lee, Jungmin and Kwon, Keunjoo},
title = {Attention-based Ensemble for Deep Metric Learning},
booktitle = {Proceedings of the European Conference on Computer Vision (ECCV)},
month = {September},
year = {2018}