Makeup Prior Models for 3D Facial Makeup Estimation and Applications

Xingchao Yang, Takafumi Taketomi, Yuki Endo, Yoshihiro Kanamori; Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR), 2024, pp. 2165-2176

In this work we introduce two types of makeup prior models to extend existing 3D face prior models: PCA-based and StyleGAN2-based priors. The PCA-based prior model is a linear model that is easy to construct and is computationally efficient. However it retains only low-frequency information. Conversely the StyleGAN2-based model can represent high-frequency information with relatively higher computational cost than the PCA-based model. Although there is a trade-off between the two models both are applicable to 3D facial makeup estimation and related applications. By leveraging makeup prior models and designing a makeup consistency module we effectively address the challenges that previous methods faced in robustly estimating makeup particularly in the context of handling self-occluded faces. In experiments we demonstrate that our approach reduces computational costs by several orders of magnitude achieving speeds up to 180 times faster. In addition by improving the accuracy of the estimated makeup we confirm that our methods are highly advantageous for various 3D facial makeup applications such as 3D makeup face reconstruction user-friendly makeup editing makeup transfer and interpolation.